TEC09 New Geometrical Arrangement to Prepare Nickel Ferrite Nanostructures on Glass Substrates Using DC Reactive Magnetron Sputtering

Abstract

Nickel ferrite (NiFe₂O₄) nanostructures were synthesized by co-sputtering of Ni and Fe targets in presence of oxygen. A dc plasma sputtering system employing closed-field unbalanced magnetron at the anode was used for the preparation of these films. The structural characteristics of the prepared films were determined and the results showed that these films are polycrystalline, highly pure, with average particle size of 20-25nm and average surface roughness of 0.465nm. These nickel ferrite nanostructures were prepared at low production cost, high reliability and reasonable structural purity.